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首頁> 外文期刊>Nuclear Instruments & Methods in Physics Research >Rotating scatter mask optimization for gamma source direction identification
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Rotating scatter mask optimization for gamma source direction identification

機(jī)譯：旋轉(zhuǎn)散射掩模優(yōu)化，用于伽瑪射線源方向識(shí)別

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Rotating scattering masks have shown promise as an inexpensive, lightweight method with a large field-of-view for identifying the direction of a gamma emitting source or sources. However, further examination of the current rotating scattering mask design shows that changing the geometry may improve the identification by reducing or eliminating degenerate solutions and lower required count times. These changes should produce more linearly independent characteristics for the mask, resulting in a decrease in the mis-identification probability. Three approaches are introduced to generate alternative mask geometries. The eigenvector method uses a spring–mass system to create a geometry basis. The binary approach uses ones and zeros to represent the geometry with many possible combinations allowing for additional design flexibility. Finally, a Hadamard matrix is modified to examine a decoupled geometric solution. Four criteria are proposed for evaluating these methodologies. An analysis of the resulting detector response matrices demonstrates that these methodologies produced masks with superior identification characteristics than the original design. The eigenvector approach produces the least linearly dependent results, but exhibits a decrease in average efficiency. The binary results are more linearly dependent than the eigenvector approach, but this design achieves a higher average efficiency than original. The Hadamard-based method produced a lower maximum, but a higher average linear dependence than the original design. Further possible design enhancements are discussed.
機(jī)譯：旋轉(zhuǎn)散射掩模已經(jīng)顯示出作為廉價(jià)，輕便的方法的希望，該方法具有用于識(shí)別一個(gè)或多個(gè)伽馬發(fā)射源的方向的大視野。但是，對(duì)當(dāng)前旋轉(zhuǎn)散射掩模設(shè)計(jì)的進(jìn)一步檢查表明，改變幾何形狀可以通過減少或消除退化的解決方案并減少所需的計(jì)數(shù)時(shí)間來提高識(shí)別度。這些變化將為掩模提供更多線性獨(dú)立的特性，從而降低了誤識(shí)別概率。引入了三種方法來生成替代的掩膜幾何形狀。特征向量法使用彈簧質(zhì)量系統(tǒng)來創(chuàng)建幾何基礎(chǔ)。二進(jìn)制方法使用一和零來表示幾何形狀，并具有許多可能的組合，從而提供了額外的設(shè)計(jì)靈活性。最后，修改Hadamard矩陣以檢查解耦的幾何解。提出了四個(gè)標(biāo)準(zhǔn)來評(píng)估這些方法。對(duì)所得檢測(cè)器響應(yīng)矩陣的分析表明，這些方法所產(chǎn)生的掩模具有比原始設(shè)計(jì)更好的識(shí)別特性。特征向量法產(chǎn)生的線性相關(guān)性最少，但平均效率卻下降。二進(jìn)制結(jié)果比特征向量方法更線性，但這種設(shè)計(jì)比原始方法具有更高的平均效率。與原始設(shè)計(jì)相比，基于Hadamard的方法產(chǎn)生的最大值較低，但平均線性相關(guān)性較高。討論了其他可能的設(shè)計(jì)增強(qiáng)。

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