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首頁> 外國專利> ETCHING RESIST COMPOSITION FOR SCREEN PRINTING WHICH HAS SIMPLE PATTERN FORMING PROCESS DUE TO THE SCREEN PRINTING AND EASILY FORM AS WELL AS REMOVE THE PATTERN

ETCHING RESIST COMPOSITION FOR SCREEN PRINTING WHICH HAS SIMPLE PATTERN FORMING PROCESS DUE TO THE SCREEN PRINTING AND EASILY FORM AS WELL AS REMOVE THE PATTERN

機(jī)譯：絲網(wǎng)印刷的抗蝕劑成分，由于絲網(wǎng)印刷和易于形成的圖案以及去除圖案，因此其圖案形成過程簡單

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摘要

PURPOSE: An etching resist composition is provided to easily form the micro-pattern without thermosetting and photocurable properties, have excellent directivity of pattern and tolerance of etchant to easily facilitate excoriating process.;CONSTITUTION: The etching resist composition comprises (a) liquid type plasticizer and (b) binary system solvent including solvent which has lower boiling point than the liquid type plasticizer. The weight of (a) component is greater than that of the (b) component. The boiling point of (a) is 200-400 °C and the boiling point of (b) is 50°C - 200 °C. The weight ratio of (a) and (b) is a:b = 5:5-9:1. The etching resist composition also includes the binder resin. The binder resin comprises the novolak group binder resin.;COPYRIGHT KIPO 2013
機(jī)譯：目的：提供一種抗蝕劑組合物，以易于形成沒有熱固性和光固化性的微圖案，具有優(yōu)異的圖案方向性和蝕刻劑的耐受性，以易于促進(jìn)脫模過程。 （b）二元體系溶劑，包括沸點(diǎn)低于液體型增塑劑的溶劑。 （a）成分的重量大于（b）成分的重量。 （a）的沸點(diǎn)為200?400℃，（b）的沸點(diǎn)為50℃?200℃。 （a）和（b）的重量比為a∶b ＝ 5∶5-9∶1?？刮g劑組合物還包含粘合劑樹脂。粘合劑樹脂包含線型酚醛清漆樹脂。; COPYRIGHT KIPO 2013

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  • 公開/公告號KR20130072576A

    專利類型

  • 公開/公告日2013-07-02

    原文格式PDF

  • 申請/專利權(quán)人 DONGWOO FINE-CHEM CO. LTD.;

    申請/專利號KR20110140065

  • 發(fā)明設(shè)計(jì)人 CHO BAEK HYUN;LIM DAE SUNG;LEE SANG HAENG;

    申請日2011-12-22

  • 分類號G03F7/00;G03F7/26;G03F7/30;

  • 國家 KR

  • 入庫時(shí)間 2022-08-21 16:26:47

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