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CMP pad construction with composite material properties using an additional manufacturing process

機譯：CMP墊結(jié)構(gòu)，具有額外的制造工藝的復(fù)合材料性能

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Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.
機譯：本公開的實施例涉及具有可調(diào)諧化學(xué)，材料和結(jié)構(gòu)性的先進(jìn)拋光墊，以及制造的新方法。根據(jù)本公開的一個或多個實施例，已經(jīng)發(fā)現(xiàn)，具有改善的性質(zhì)的拋光墊可以通過添加劑制造工藝來制造，例如三維（3D）印刷過程。因此，本公開的實施例可以提供一種先進(jìn)的拋光墊，其具有由至少兩種不同材料形成的離散特征和幾何形狀，所述不同材料包括功能聚合物，功能性低聚物，反應(yīng)性稀釋劑和固化劑。例如，先進(jìn)的拋光墊可以通過多個聚合物層形成，通過至少一種樹脂前體組合物的自動順序沉積，其次是至少一種固化步驟，其中每個層可以代表至少一種聚合物組合物，和/或不同組成的區(qū)域。

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